29)      A FT-IR study of silicon dioxides for VLSI Microelectronics

            W. Bensch, W. Bergholz

            Semicond. Sci. Techn. 1990, 5, 421-428. DOI:10.1088/0268-1242/5/5/008

30)      Improvement of oxide quality by rapid thermal annealing

            H. Wendt, A. Spitzer, W. Bensch, K. v. Sichart

            J. Appl. Phys. 1990, 67, 7531-7535. DOI:10.1063/1.345815

31)      Structure and thermochemical Reactivity of CaRuO₃ and SrRuO₃

            W. Bensch, H. Schmalle, A. Reller

            Solid State Ionics 1990, 43, 171-177. DOI:10.1016/0167-2738(90 )90481-6