Publikationen 1990
29) A FT-IR study of silicon dioxides for VLSI Microelectronics
W. Bensch, W. Bergholz
Semicond. Sci.
Techn. 1990, 5, 421-428. DOI:10.1088/0268-1242/5/5/008
30) Improvement of oxide quality by rapid thermal annealing
H. Wendt, A. Spitzer, W. Bensch, K. v. Sichart
J. Appl. Phys. 1990,
67, 7531-7535. DOI:10.1063/1.345815
31) Structure and thermochemical Reactivity of CaRuO3 and SrRuO3
W. Bensch, H. Schmalle, A. Reller
Solid State Ionics 1990,
43, 171-177. DOI:10.1016/0167-2738(90 )90481-6